Our sensor wafer (Capella Series) supplies a line-up for measuring the temperature and plasma in the ESC and Bath of etching equipment. Customers can choose according to the high temperature/extreme temperature and plasma conditions, and EUV measurement line-up and plasma density measurement line-up will be added in the future, and the line-up is expanding to various measurement environments. In addition, station and coupe can be selected as components suitable for the measurement environment, and an analysis program for analysis of measured values is also organized. It is also possible to develop and collaborate to meet the customer's acceptance and needs.
Wafer type sensor Ass'y
Cradle dedicated to Sensor Wafer utilization
Cassette for Sensor Wafer utilization in process equipment
Dedicated program for utilizing Sensor Wafer
